Design of Semiconductor Manufacturing Equipment Function Simulation System Based on SEMI Standard
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Graphical Abstract
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Abstract
A general and configurable simulation platform based on SEMI standard is designed. On this general platform, a gas pressure subsystem simulation platform is implemented, which has the function layer, logic layer and communication interface layer. This system can meet the needs of both a single device and a whole system. Results show that the operation of the valve and the change of the gas flow in physical vapor deposition (PVD) system can be simulated in real time.
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