JING Yu-lan, ZHANG Huai-wu, JIANG Xiang-dong. Influence of Rapid Recurrent Thermal Annealing on Magnetic Properties of CoFe-O Thin Film[J]. Journal of University of Electronic Science and Technology of China, 2006, 35(2): 246-248.
Citation: JING Yu-lan, ZHANG Huai-wu, JIANG Xiang-dong. Influence of Rapid Recurrent Thermal Annealing on Magnetic Properties of CoFe-O Thin Film[J]. Journal of University of Electronic Science and Technology of China, 2006, 35(2): 246-248.

Influence of Rapid Recurrent Thermal Annealing on Magnetic Properties of CoFe-O Thin Film

  • The variation of magnetic properties with new Rapid Recurrent Thermal Annealing (RRTA) has been studied in high moment thin film (Co0.35Fe0.65)99O1. After the rapid recurrent thermal annealing the coercivity as-deposited this thin film decreases from 105 to 3 Oe at 450℃ for several periods of times, their resistivity decreases to 70%, and the size of a-Fe(Co)phase can be reduced to 15~35 nm by analysis. Results show that the method is more effective than other methods to improve the magnetic and electrical properties of (Co0.35Fe0.65)99O1 thin films.
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