Ruan Shichi. Analysis of Disfuction Principle of A Series of RY-2W-15k Resistor[J]. Journal of University of Electronic Science and Technology of China, 1999, 28(1): 103-107.
Citation:
Ruan Shichi. Analysis of Disfuction Principle of A Series of RY-2W-15k Resistor[J]. Journal of University of Electronic Science and Technology of China, 1999, 28(1): 103-107.
Ruan Shichi. Analysis of Disfuction Principle of A Series of RY-2W-15k Resistor[J]. Journal of University of Electronic Science and Technology of China, 1999, 28(1): 103-107.
Citation:
Ruan Shichi. Analysis of Disfuction Principle of A Series of RY-2W-15k Resistor[J]. Journal of University of Electronic Science and Technology of China, 1999, 28(1): 103-107.
Analysis of Disfuction Principle of A Series of RY-2W-15k Resistor
A series of RY-2W-15k resistor is analyzed with EPMA. It is proved that the poorer the quality of insulated coat is, the poorer function it has against wet and etch. As the resistor absorbs moisture or/and eching gas, the electroconductive film of resistor is etched for electrolysis, which results in resistor disfuction.
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