Zhou Rong, Hu Sifu, Zhang Qinzhong. Improvement of Ballasting for Silicon Bipolar Power Transistor[J]. Journal of University of Electronic Science and Technology of China, 1999, 28(5): 486-489.
Citation: Zhou Rong, Hu Sifu, Zhang Qinzhong. Improvement of Ballasting for Silicon Bipolar Power Transistor[J]. Journal of University of Electronic Science and Technology of China, 1999, 28(5): 486-489.

Improvement of Ballasting for Silicon Bipolar Power Transistor

  • From the reliability and the gain, the existing ballasting resistor for silicon bipolar power transistor is carefully analyzed, and the improved method is proposed. The results indicate the improved compound ballasting resistor not only effectively prevents the "Runaway" and the second breakdown caused by current concentrating, improves transistor's reliability and life time, but also helps improve power transistor's power gain.
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